fig17

Progress on hafnium oxide-based emerging ferroelectric materials and applications

Figure 17. The I-V characteristic curves of (A) Ti/TiO2/Si and (B) Ti/TiO2/HfO2/Si devices. (C) Recognition accuracy of Ti/TiO2/Si devices and Ti/TiO2/HfO2/Si devices[142]. Reprinted from Ref.[142], Copyright (2020), with permission from Elsevier. (D) W/TiO2/HfO2/TaN devices withstand more than 107 switching cycles. (E) W/TiO2/HfO2/TaN devices remain unchanged for more than 104 s at 125 °C. (F) LTP, LTD, and STDP behaviors of W/TiO2/HfO2/TaN devices[143]. Reprinted from Ref.[143], Copyright (2022), with permission from Elsevier. (G) Enhancement and suppression characteristics of Pt/Ta2O5/HfO2/TiN devices. (H) PPD test results. (I) Recognition accuracy of the Fashion MNIST dataset[108]. Reprinted from Ref.[108], Copyright (2021), with permission from Elsevier.

Microstructures
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