fig1

Figure 1. (A) Schematic illustration of the deposition process via the dip-flush method; (B-D) Water contact angles on SAM-modified ITO substrates: (B) control (dip-coated only), (C) 3-FPy post-treatment, and (D) 3-MeOPy post-treatment; (E-G) O 1s XPS core-level spectra of the corresponding SAM surfaces: (E) control, (F) 3-FPy post-treatment, and (G) 3-MeOPy post-treatment. ITO: Indium tin oxide; 4PADCB: 4-(7H-dibenzo[c,g]carbazol-7-yl)butyl phosphonic acid; SAM: self-assembled monolayer; XPS: X-ray photoelectron spectroscopy; 3-FPy: 3-fluoropyridine; 3-MeOPy: 3-methoxypyridine.